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Zirconium Oxide Rotary Sputtering Target
Senxiang is a leading China Zirconium Oxide Rotary Sputtering Target manufacturer, supplier and exporter. Adhering to the pursuit of perfect quality of products, so that our Zirconium Oxide Rotary Sputtering Target have been satisfied by many customers. Extreme design, quality raw materials, high performance and competitive price are what every customer wants, and that's also what we can offer you. Of course, also essential is our perfect after-sales service. If you are interested in our Zirconium Oxide Rotary Sputtering Target services, you can consult us now, we will reply to you in time!
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Product Description
Zirconium Oxide Rotary Sputtering Target material is applicable to various single-target sputtering systems, multi-target sputtering systems, ion sputtering systems and other magnetron sputtering equipment. Its application fields include: scientific experiment or research applications, micro-nano processing, device manufacturing and other related customized products. Zirconium Oxide Rotary Sputtering Target is used for semiconductor chips, solar photovoltaic, plane display, special coatings, etc
Product Parameter (Specification)
| Composition | ZrOx |
| Purity | ≥99% |
| Density （g/cm³） | ≥4.72 |
|
Electrical resistivity (Ω.cm) |
≤10 |
| Theoretical density (g/cm3) | 5.55 |
|
Metal impurity (ppm) |
Al2O3≤4000,Fe2O3≤4000,Total≤10000 |
| Dimension (mm) |
Maximal OD 145-151 Maximal Length 4000 |
Product Feature And Application
Zirconium Oxide Rotary Sputtering Target is used for semiconductor chips, solar photovoltaic, plane display, special coatings, etc
Product Details
Our Zirconium Oxide Rotary Sputtering Target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
