Zinc-Tin Alloy Rotary Sputtering Target
Senxiang specializes in producing high-purity Zinc-Tin Rotary Alloy Sputtering Target with the highest density and the smallest average grain size for semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) displays and optical applications.You can rest assured to buy Zinc-Tin Alloy Rotary Sputtering Target from our factory and we will offer you the best after-sale service and timely delivery.
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Product Description
Senxiang Zinc-Tin Rotary Alloy Sputtering Target has perfect density, high purity and very fine grain structure, smooth surface, no crack, no edge collapse, no foreign inclusions and pollutants, and Zinc-Tin Alloy Rotary Sputtering Target widely used in large-area glass coating (Low-E) manufacturing construction glass industry.
Product Parameter (Specification)
| Composition |
90wt%Zn + 10wt%Sn 50wt%Zn + 50wt%Sn |
| Purity | ≥ 99.9% |
| Density （g/cm³） | ≥6.42 / ≥6.43 |
|
Electrical resistivity (Ω.cm) |
|
| Theoretical density (g/cm3) | 7.156 / 7.22 |
|
Metal impurity (ppm) |
Fe≤220, Cu≤130, Pb≤130, Cd≤90, Bi≤55 Total≤1000 |
| Dimension (mm) |
Maximal OD 162 Maximal Length 4000 |
Product Feature And Application
Zinc-Tin Rotary Alloy Sputtering Target widely used in large-area glass coating (Low-E) manufacturing construction glass industry.
Product Details
Our Zinc-Tin Alloy Rotary Sputtering Target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
