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Titanium Aluminum Alloy Sputtering Target
  • Titanium Aluminum Alloy Sputtering TargetTitanium Aluminum Alloy Sputtering Target
  • Titanium Aluminum Alloy Sputtering TargetTitanium Aluminum Alloy Sputtering Target

Titanium Aluminum Alloy Sputtering Target

Senxiang is a high-tech enterprise specializing in the research and development of Titanium Aluminum Alloy Sputtering Target. It can produce a full range of Titanium Aluminum Alloy Sputtering Target, which can be customized according to your needs.

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Product Description

TiAlN coating is formed by the reaction of Titanium Aluminum Alloy Sputtering Target with nitrogen during the deposition process. It has good toughness and oxidation resistance, which greatly improves the cutting speed and cutting performance of drill bits, cutters, indexable inserts and other tools and dies. Titanium Aluminum Alloy Sputtering Targetcan also be used for coating mobile phones, watches, glasses and some decorations. It is wear-resistant, bright and durable, and is popular with customers.

Senxiang is a high-tech enterprise specializing in the research and development of Titanium Aluminum Alloy Sputtering Target. It can produce a full range of TiAl targets, which can be customized according to your needs, whether it is tubular targets, arc targets, or plane targets, no matter how high the aluminum content. The TiAl target produced by our company's smelting method has high density, low gas content and high purity, and the deposited coating is smooth and has excellent performance; The Titanium Aluminum Alloy Sputtering Target produced by powder method has fine grains, good thermal conductivity and mechanical properties. You can also adjust the microstructure of the target according to your needs, regardless of fine grain, axial and network.


Product Parameter (Specification)

Composition 67at%Ti + 33at%Al
60at%Ti+40at%AI
50at%Ti + 50at%Al
30at%Ti+70at%AI
Purity ≥99.8%
Density (g/cm³) >3.88 / >3.75 / >3.57 / >3.21
Electrical resistivity
(Ω.cm)
Theoretical density (g/cm3) 3.93 / 3.80 / 3.62 / 3.25
Metal impurity
(ppm)
Total ≤ 2000
Dimension (mm) Square plate: (50-1500)L×(50-200)W×(4-20)H
Circular plate: 0(50-400)×(4-20)H


Product Feature And Application

TiAlN coating is formed by the reaction of Titanium Aluminum Alloy Sputtering Target with nitrogen during the deposition process. It has good toughness and oxidation resistance, which greatly improves the cutting speed and cutting performance of drill bits, cutters, indexable inserts and other tools and dies. Titanium Aluminum Alloy Sputtering Targetcan also be used for coating mobile phones, watches, glasses and some decorations. It is wear-resistant, bright and durable, and is popular with customers.


Product Details

Our Titanium Aluminum Alloy Sputtering Target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.


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