Silicon Sputtering Target
Senxiang (Ningbo) New Materials Co., Ltd. provides silicon for PVD processing in various forms. For the application of silicon sputtering target, silicon can be produced in single crystal or polycrystalline crystal structure. planar silicon targets are metal bonded to the copper backplane, however, they can also be provided in the form of single chip as required. Silicon sputtering target can be element-deposited to produce Si synthetic film, or reactive to produce SiO2 or Si3N4 synthetic film by adding partial pressure of oxygen or nitrogen.
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Product Description
The silicon sputtering target is dark gray. Silicon is solid at room temperature, with a melting point of 1414 ° C (2577 ° F) and a boiling point of 3265 ° C (5909 ° F). Unlike water and most other substances, its density in liquid is higher than that in solid. Silicon has high thermal conductivity and good thermal conductivity of 149 W • m-1 • K-1. Silicon sputtering target is mainly used for reactive magnetron sputtering deposition of dielectric layers such as SiO2 and SiN, dielectric properties and wear resistance. The corrosion resistance of silicon targets has broad application prospects in the fields of optics and microelectronics, and is widely used as functional materials worldwide. At present, silicon sputtering target is mainly used in LCD transparent conductive glass, construction of LOW-E glass and microelectronics industry. Silicon planar sputtering targets can be divided into two types: single crystal and polycrystalline. We use Czochralski crystal growth method to produce silicon planar sputtering target.
Product Parameter (Specification)
| Composition | Si |
| Purity | ≥99.999% |
| Density （g/cm³） | 2.33 |
|
Electrical resistivity (Ω.cm) |
|
| Theoretical density (g/cm3) | 2.33 |
|
Metal impurity (ppm) |
Total≤10 |
| Dimension (mm) |
Square plate: (50-300)L×(50-150)W×(3-12)H Circular plate: 0(5O-35O)×(3-12)H |
Product Feature And Application
The silicon sputtering target is mainly used in semiconductor chip, flat panel liquid crystal display (LCD), decoration and functional coating industry, solar panel, data storage industry (optical disk industry), optical communication industry, glass coating (building glass and automobile glass) industry, corrosion and wear resistance (surface modification) and other fields.
Product Details
Indium Bonding and Elastomeric Target Bonding Service are available for silicon sputtering target
Our silicon sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
