Silicon Rotary Sputtering Target
Senxiang (Ningbo) New Materials Co., Ltd. provides Silicon is an important kind of sputtering target materials, mainly used in the reaction system of magnetron sputtering plating SiO2 and SiN dielectric layer, as an important functional thin film materials, they have good hardness, optical and dielectric properties and wear resistance, corrosion resistance and other characteristics, in optics, microelectronics, and other fields has a broad prospect of application and functional materials are widely international attention. The silicon rotary sputtering target is dark gray.
Send Inquiry
Product Description
The silicon rotary sputtering target is dark gray. Silicon is solid at room temperature, with a melting point of 1414 ° C (2577 ° F) and a boiling point of 3265 ° C (5909 ° F). Like water, unlike most other substances, its density in the liquid is higher than that in the solid, and it will expand when it freezes. Silicon has a high thermal conductivity of 149 W • m-1 • K-1 and good thermal conductivity. Silicon rotary sputtering target is mainly used in reactive magnetron sputtering to deposit dielectric layers such as SiO2 and SiN. As important functional film materials, they have good hardness, optical, dielectric properties and wear resistance. The corrosion resistance of silicon targets has broad application prospects in the fields of optics and microelectronics, and is currently widely used as functional materials worldwide. At present, it is mainly used in LCD transparent conductive glass, building LOW-E glass and microelectronics industry. Silicon rotary sputtering targets can be divided into two types: single crystal and polycrystalline. We produce silicon rotary sputtering target by czochralski crystal growth method.
Product Parameter (Specification)
| Composition | Si |
| Purity | > 99.99% |
| Density （g/cm³） | ≥2.2 |
|
Electrical resistivity (Ω.cm) |
≤40 |
| Theoretical density (g/cm3) | 2.32 |
|
Metal impurity (ppm) |
Fe≤60, Al≤30, Ca≤10 ,Total≤100 |
| Dimension (mm) |
Maximal OD 151 Maximal Length 4000 |
Product Feature And Application
The silicon rotary sputtering target is mainly used in semiconductor chip, flat panel liquid crystal display (LCD), decoration and functional coating industry, solar panel, data storage industry (optical disk industry), optical communication industry, glass coating (building glass and automobile glass) industry, corrosion and wear resistance (surface modification) and other fields.
Product Details
Our silicon rotary sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.We can provide bonding services
