Senxiang molybdenum sputtering target is a high-purity molybdenum raw material used for sputtering and depositing thin films. According to different shapes, molybdenum sputtering targets can be divided into round, rectangular, square, annular, elliptical, cylindrical, planar and rotatable (rotating) molybdenum targets. It has excellent conductivity and thermal conductivity, small thermal expansion coefficient and strong corrosion resistance.
Read MoreSend InquirySenxiang (Ningbo) New Materials Co., Ltd. provides silicon for PVD processing in various forms. For the application of silicon sputtering target, silicon can be produced in single crystal or polycrystalline crystal structure. planar silicon targets are metal bonded to the copper backplane, however, they can also be provided in the form of single chip as required. Silicon sputtering target can be element-deposited to produce Si synthetic film, or reactive to produce SiO2 or Si3N4 synthetic film by adding partial pressure of oxygen or nitrogen.
Read MoreSend InquiryThe chromium sputtering target materials provided by Senxiang (Ningbo) New Materials Co., Ltd. have various forms, purity, size and price. Other customized chromium sputtering target products can also be provided according to your requirements.an and American markets. We look forward to becoming your long-term partner in China.
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