FAQ

The kinetic energy exchange between the ions and the atoms on the solid surface makes the solid Atoms on the surface leave the solid and deposit on the surface of the substrate. The bombarded solid is the raw material for sputtering thin films, called sputtering targets.

The full name of ITO is indium tin oxide, which is composed of indium, tin and oxygen in different proportions. The material of ITO and ITO sputtering target is the same. The latter is actually a black gray ceramic semiconductor formed by mixing indium oxide and tin oxide powder in a certain proport......

Sputtered target material is a material that generates thin films through sputtering and is manufactured by processing metal and ceramics. We integrate melting technology, sintering technology, synthesis technology, and processing technology to process products of various materials, purity, and shap......