I-ZnO Sputtering Target

Senxiang (Ningbo) New Materials Co., Ltd. provides a full range of sputtering targets. We ensure the long-term availability of raw materials, constantly strive to develop new product sizes and geometric shapes, and make our production capacity adapt to the quantity requirements of customers. With huge purchasing and production capacity, Senxiang can provide high-quality i-ZnO Sputtering Target at a competitive price.

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Product Description

i-ZnO Sputtering Target. The direct current (dc) magnetron sputtering system is utilized for the film deposition. Without/with the ion-assisted deposition (IAD) technique, the electrical, optical, and structural properties of these films prepared by different dc powers (such as 50 W, 80 W, and 100 W) are an optimal IZO deposition condition which is developed for flexible organic light-emitting device (OLED) applications.

Product Parameter (Specification)

Composition	ZnO
Purity	≥99.95%
Density （g/cm³）	≥5.4
Electrical resistivity (Ω.cm)	≤0.5
Theoretical density (g/cm3)	5.606
Metal impurity (ppm)	Fe ≤100, Si ≤ 100, Na≤50, Pb≤20, Ca≤50, Others≤180 Total≤500
Dimension (mm)	Planar target (50~300 )Lx( 50~250 )Wx(4~15 )H Rotary target (133~138 )IDx( 151~169 )ODx( 150~260 )H