Hafnium Sputtering Target
  • Hafnium Sputtering TargetHafnium Sputtering Target
  • Hafnium Sputtering TargetHafnium Sputtering Target

Hafnium Sputtering Target

Senxiang has been specializing in the production of Ultra-high purity Hafnium sputtering target for many years.Our company can provide imported low zirconium high-purity hafnium, which can be processed into target materials, particles, etc.You are welcomed to come to our factory to buy the latest selling, low price, and high-quality Ultra-high purity Hafnium sputtering target. We look forward to cooperating with you.

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Product Description

Ultra-high purity Hafnium sputtering target has the same performance as metal hafnium. Its melting point is 2233 ℃, boiling point is 4603, and density is 13.31g/cm3. It is a shiny silver gray transition metal. Metal hafnium has moderate strength, good corrosion resistance, and high neutron absorption capacity, and is widely used in the atomic energy industry; Hafnium can generate various alloys and also serve as a surface coating for base metals.


Product Parameter (Specification)

Composition Hf
Purity 99.95% 99.99%
Density 13.31g/cm3
Boiling point 4603°C
Melting point 2233°C
Surface roughness Ra3.2
Tolerance ±0.1mm


Product Feature And Application

Introducing oxygen partial pressure can be used to prepare hafnium oxide thin films by sputtering hafnium sputtering targets with electric sputtering or reactive sputtering. The obtained films can be used for a variety of purposes, including optical coatings for photonics, film resistors, corrosion resistance, nuclear products, gate insulators and sensors in integrated circuits.


Product Details

Our Hafniumt Sputtering Target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.



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