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Aluminum Vanadium Planar Alloy Sputtering Target
  • Aluminum Vanadium Planar Alloy Sputtering TargetAluminum Vanadium Planar Alloy Sputtering Target
  • Aluminum Vanadium Planar Alloy Sputtering TargetAluminum Vanadium Planar Alloy Sputtering Target
  • Aluminum Vanadium Planar Alloy Sputtering TargetAluminum Vanadium Planar Alloy Sputtering Target
  • Aluminum Vanadium Planar Alloy Sputtering TargetAluminum Vanadium Planar Alloy Sputtering Target
  • Aluminum Vanadium Planar Alloy Sputtering TargetAluminum Vanadium Planar Alloy Sputtering Target

Aluminum Vanadium Planar Alloy Sputtering Target

Senxiang (Ningbo) New Material Co., Ltd. is a leading China Aluminum Vanadium Planar Alloy Sputtering Target manufacturer, supplier and exporter. Adhering to the pursuit of perfect quality of products, so that our Aluminum Vanadium alloy target have been satisfied by many customers. Extreme design, quality raw materials, high performance and competitive price are what every customer wants, and that's also what we can offer you. Of course, also essential is our perfect after-sales service. If you are interested in our Aluminum Vanadium alloy target services, you can consult us now, we will reply to you in time!

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Product Description

Al-V target is one of the Aluminum Vanadium Planar Alloy Sputtering Target used in the vacuum deposition industry. It is a product of high-purity aluminum and vanadium after series processing. It has a specific size and shape of high-purity Al-V material, which is installed on the vacuum deposition machine and sputtered to form a film.

Aluminum vanadium is a vanadium additive used in the production of titanium alloys such as Ti-6Al-4V. According to the vanadium content, it is divided into three levels: 50%, 65%, and 85%, with the remaining amount being aluminum. Aluminum vanadium alloy is an intermediate alloy, mainly used as an element additive in the production of titanium alloys, high-temperature alloys, and certain special alloys. It is a high-level alloy material widely used in the aerospace field, with high hardness, elasticity, seawater resistance, and lightness. It is used to make seaplanes and gliders.


Product Parameter (Specification)

Composition AlV
Purity 99.99%
Density customized
Impurity content 0.2%
Maximum size L≤2000mm,W≤200mm
Maximal OD According to customer
Maximal Length According to customer
Production process Vacuum Melting,PM


Product Feature And Application

Aluminum Vanadium Planar Alloy Sputtering Target is an intermediate alloy, mainly used as an element additive in the production of titanium alloys, high-temperature alloys, and certain special alloys.

Vanadium aluminum alloy is an advanced alloy material widely used in the aerospace field, with high hardness, elasticity, seawater resistance, and lightness. It is used to manufacture seaplanes and gliders.


Product Details

Our Aluminum Vanadium alloy sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.


Hot Tags: Aluminum Vanadium Planar Alloy Sputtering Target, China, Manufacturers, Suppliers, Factory, Made in China, Customized

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