With years of experience in production Aluminum Neodymium Planar Alloy Sputtering Target , Senxiang (Ningbo) New Material Co., Ltd. can supply a wide range of Aluminum neodymium alloy target . High quality Aluminum neodymium alloy target can meet many applications, if you need, please get our online timely service about Aluminum neodymium alloy target . In addition to the product list below, you can also customize your own unique Aluminum neodymium alloy target according to your specific needs.
Aluminum Neodymium Planar Alloy Sputtering Target has lower resistivity and better corrosion resistance; In addition, the excellent aluminum neodymium alloy target material has low residual stress after post heat treatment in the manufacturing process of thin film transistors, which is not easy to generate concavity and convexity, which is conducive to optimizing the coating process. Aluminum neodymium targets are mainly used for: 1. the manufacturing process of tft electrode structures that prevent metal layer diffusion in flat panel displays; 2. Connecting metal wiring electrodes in the field of LCD and flat panel touch display; 3. Other applications in the electronic manufacturing industry. The requirements for aluminum neodymium targets in these fields are uniform structure, sufficient alloying, and appropriate crystal particle size, which is conducive to obtaining dense sputtered films and uniform film thickness.
Composition | 97wt%Al+ 3wt%Nd / 98wt%AI+ 2wt%Nd |
Purity | ≥99.99% |
Density | customized |
Metal impurity | Total≤500 |
Dimension | (50-1500)Lx (50- 200)Wx(4- 20)H |
Size | According to customer |
OEM/ODM | Accept |
Aluminum Neodymium Planar Alloy Sputtering Target is mainly used in the flat panel display industry.
Our Aluminum neodymium alloy sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.