Senxiang produce Aluminum Chromium Alloy Sputtering Target with different shapes like disk, rectangle, column, step and custom shape. The typical diameter for circular targets include 1 inch, 2 inch, 3 inch, 4 inch or 50mm, 60mm, 80mm, 100mm etc. Typical thickness include 0.125 inch and 0.25 inch or 3mm, 4mm, 5mm, 6mm etc. Sputtering targets can be bonded with copper backing plate as reuqest.
Different purity, shape and size can also be custom-made for Aluminum Chromium (Al-Cr) Alloy Sputtering Targets. You can send us your inquiry for a quote.
Aluminum Chromium Alloy Sputtering Target is a new type of target used in the field of coating of tools such as instant alloy tools and heat treatment dies, which can improve the anti-wear ability and service temperature of the film. The aluminium-chromium alloy target is produced by the advanced hot isostatic pressing process. The products include the shape target, the arc view and the large aspect ratio of the integrally-formed tube, etc., which have the advantages of wide composition proportion range (aluminum content is 10at%~90at%), high purity and density, fine and uniform grains, long service life and so on.
The ratio of commonly used aluminum and chromium is 30:70at%, 50:50at%, 25:75at%, etc.: specifications and purity can be customized.
Composition |
70at%AI + 30at%Cr 60at%AI+40at%Cr 50at%AI + 50at%Cr |
Purity | ≥99.99% |
Density (g/cm³) | >3.99 / >4.43 / >4.88 |
Electrical resistivity (Ω.cm) |
|
Theoretical density (g/cm3) | 4.05 / 4.50 / 4.95 |
Metal impurity (ppm) |
Total < 1000 |
Dimension (mm) |
Square plate: (50-400)L×(50-200)W×(4-20)H Circular plate: Φ(50-400)×(4-20)H |
Aluminum Chromium Alloy Sputtering Target is applied in the field of coating of tools such as instant alloy tools and heat treatment moulds
Our Aluminum Chromium Alloy Sputtering Target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.