Alumina Rotary Sputtering Target is one of the sputtering targets used in the vacuum coating industry. It is a product of high-purity aluminum after a series of processing. It has a specific size and shape of high-purity aluminum material. It is installed on the vacuum coating machine and sputtered into a film
Alumina Rotary Sputtering Target are applicable to DC bipolar sputtering, bipolar sputtering, four-stage sputtering, radio frequency sputtering, opposite-target sputtering, ion beam sputtering, magnetron sputtering, etc. They can be coated with reflective film, conductive film, semiconductor film, capacitor film, decorative film, protective film, integrated circuit, display, etc. Compared with other targets, the price of aluminum targets is lower, Therefore, aluminum rotary sputtering target is the preferred target material under the premise of meeting the function of the film.
Aluminum targets are divided into aluminum plane sputtering target and aluminum rotary sputtering target. The plane aluminum target is flaky, including round and square.
The Alumina Rotary Sputtering Target is tubular and has high utilization efficiency, but it is not easy to process. The finished aluminum rotary target can only be produced through a variety of processing procedures such as extrusion, stretching, straightening, heat treatment, machining and so on.
Composition | Al |
Purity | ≥99.9% |
Density (g/cm³) | ≥2.3 |
Electrical resistivity (Ω.cm) |
|
Theoretical density (g/cm3) | 2.7 |
Metal impurity (ppm) |
Fe≤600, Cu≤100, Ti≤150, Zn≤100 Total≤1000 |
Dimension (mm) |
Maximal OD 145-162 Maximal Length 4000 |
Aluminum rotary sputtering target can be coated with reflective film, conductive film, semiconductor film, capacitor film, decorative film, protective film, integrated circuit, display, etc
Our Alumina Rotary Sputtering Target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.