Senxiang (Ningbo) New Material Co., Ltd. is a manufacturer and supplier of Alumina Doped ZInc Oxide (AZO) Rotary Sputtering Target in China. We have been committed to the production, research and development, sales and service of target materials for many years. Our products have good price advantages, covering most European and American markets. We look forward to becoming your long-term partner in China.
Senxiang (Ningbo) New Materials Co., Ltd. provides a full range of sputtering targets, including precious metals, pure metals, alloys, ceramics, cermets, borides, oxides, carbides, nitrides, silicides and fluorides. We ensure the long-term availability of raw materials, constantly strive to develop new product sizes and geometric shapes, and make our production capacity adapt to the quantity requirements of customers. With huge purchasing and production capacity, Senxiang can provide high-quality Alumina Doped ZInc Oxide (AZO) Rotary Sputtering Target at a competitive price.
Alumina Doped ZInc Oxide (AZO) Rotary Sputtering Target is a transparent conductive oxide, which is usually used as a transparent electrode for solar photovoltaic applications and large-area architectural glass coating.Senxiang offers high purity (99.95%), high density (>98%) and low resistivity rotatable Alumina Doped ZInc Oxide(AZO)Rotary Sputtering Target.
Composition |
98wt%ZnO+2wt%AL2O3 (*Other alumina doping concentration can also be produced on request) |
Purity | >99.95wt% |
Density (g/cm³) | 5.53±0.03 (*Theoretical density :5.58) |
Electrical resistivity (Ω.cm) |
≤3*10-3 |
Metal impurity (ppm) |
Fe≤100,Si≤100,Na≤50,Pb≤20,Ca≤50,Other≤180 Total≤500 |
Dimension (mm) |
(133-134)ID*(145-166)OD*(150-260)H Support customization |
Bonding ratio | >90% |
AZO targets are used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Low-E Glass Industry (Architectural glass, Automotive glass)
Thin Film Photovoltaic Industry (TCO)
Flat Panel Displays
Senxiang offers high purity (99.95%), high density (>98%) and low resistivity rotatable AZO sputtering target.