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China Alloy Sputtering Target Manufacturers, Suppliers, Factory
Alloy sputtering target coating can be simply understood as using electrons or high-energy lasers to bombard the target, causing surface components to be sputtered out in the form of atomic clusters or ions, and ultimately deposited on the substrate surface, undergoing a film forming process, resulting in the formation of a thin film.
Sputtered coatings can be divided into many types. Overall, the difference from evaporation coatings is that the sputtering rate will become one of the main parameters. The laser sputtered coating PLD in sputtering coating can easily maintain component uniformity, while atomic scale thickness uniformity is relatively poor (due to pulse sputtering), and the control of crystal orientation (outer edge) growth is also relatively general.
Senxiang can trial-produce various types of rotating and planar alloy sputtering targets according to customer requirements. The doping rate and product size can be customized. Welcome to consult.
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Titanium Aluminum Alloy Sputtering Target
Senxiang is a high-tech enterprise specializing in the research and development of Titanium Aluminum Alloy Sputtering Target. It can produce a full range of Titanium Aluminum Alloy Sputtering Target, which can be customized according to your needs.
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Aluminum Neodymium Alloy Sputtering Target
Senxiang specializes in producing high-purity Aluminum Neodymium Alloy Sputtering Target with the highest density. The high-purity (99.9%) Al-Nd alloy sputtering target with the smallest average grain size can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) displays and optical applications.
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Molybdenum Niobium Alloy Sputtering Target
Molybdenum niobium (MoNb) is used as a special corrosion-resistant contact of ITO sensor in the touch panel. Senxiang's Molybdenum Niobium Alloy Sputtering Target meets the most stringent quality requirements. From specially pure metal powder to finished target, we concentrate the whole manufacturing process under one roof. Our Molybdenum Niobium Alloy Sputtering Target can be used as flat targets and rotating targets of all common sizes.
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Zinc-Alumina Alloy Rotary Sputtering Target
Senxiang is an expert in producing Zinc-Alumina Alloy Rotary Sputtering Target. All Zinc-Alumina Alloy Rotary Sputtering Targets are manufactured by the procedure of the highest density and the smallest average grain size possible. The best detection methods are used for analysis, including chemical analysis, crystal phase microscope, X-ray diffraction (XRD), X-ray fluorescence (XRF), glow discharge mass spectrometry (GDMS) and inductively coupled plasma (ICP)
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Zinc-Tin Alloy Rotary Sputtering Target
Senxiang specializes in producing high-purity Zinc-Tin Rotary Alloy Sputtering Target with the highest density and the smallest average grain size for semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) displays and optical applications.You can rest assured to buy Zinc-Tin Alloy Rotary Sputtering Target from our factory and we will offer you the best after-sale service and timely delivery.
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Tungsten Titanium Planar Alloy Sputtering Target
Tungsten Titanium Planar Alloy Sputtering Target has low electron mobility, stable thermal mechanical properties, good corrosion resistance and good chemical stability. In recent years, tungsten-titanium alloy sputtering targets have been used as contact layer materials for gate circuits of semiconductor chips. In addition, tungsten titanium alloy sputtering target can also be used as barrier layers in the metal connection of semiconductor devices. It is used in high temperature environment, mainly for vlsi and solar cells.
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